DuPont FX900 Series

• Negative working, aqueous processable dry film photoresist.
• Suitable for print-and-etch and tent-and-etch applications with acid and alkaline etchants.
• Ideal for use with very thin-core laminate, including flexible and flex/rigid substrates
• Compatible with acid copper, tin, tin/lead, nickel sulfamate and acid golf electrolyte plating baths
• very high resolution capability with wide processing latitude.