DuPont FX900 Series

  • Negative working, aqueous processable dry film photoresist.
  • Suitable for print-and-etch and tent-and-etch applications with acid and alkaline etchants.
  • Ideal for use with very thin-core laminate, including flexible and flex/rigid substrates
  • Compatible with acid copper, tin, tin/lead, nickel sulfamate and acid golf electrolyte plating baths
  • very high resolution capability with wide processing latitude.

 

 

DuPont Riston Dry Film Selection Guide

 

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